Numerical study of Extreme-ultraviolet emission from laser-produced plasma using particle-in-cell method
Po-Yen Lai1*, Shih-Hung Chen1
1Department of Physics, National Central University, Jung-Li, Taiwan
* presenting author:柏延賴,
A collisional relativistic particle-in-cell (PIC) model combining ionization processes has been developed to study the critical issue of semiconductor devices, which is extreme ultraviolet (EUV) light source from laser-produced plasma. Instead of hydrodynamic view, the kinetic model describes the laser heating, energy transport and ultrafast electron dynamics with least approximations. The integrated numerical model is achieved by simulating the dense plasma by collisional PIC model and estimating EUV emission according to the weighted oscillator strengths of various line transitions.

Keywords: collisional particle-in-cell , extreme ultraviolet , weighted oscillator strengths