Tuning the work function of graphene by nitrogen plasma treatment
曾建洲1, 林祐仲1*
1光電科技研究所, 國立彰化師範大學, 彰化市, Taiwan
* presenting author:林祐仲, email:rzr2390@yahoo.com.tw
Graphene prepared by the chemical vapor deposition method was treated with nitrogen plasma under different radio-frequency (rf) power conditions in order to experimentally study the change in the work function. Control of the rf power could change the work function of graphene from 4.91 eV to 4.37 eV. It is shown that the increased rf power may lead to the increased number of graphitic nitrogen, increasing the electron concentration and shifting the Fermi level to higher energy. The ability to controllably tune the work function of graphene is essential for optimizing the efficiency of optoelectronic and electronic devices.


Keywords: Graphene, Work function